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Intelligent Micro Patterning

SF-100 XCEL
Manual, Low Cost Patterning of Mesoscale Features
SF-100 XPRESS
Customised System Specified to Your Exact Requirements
SF-100 XTREME
Full Featured Highly Flexible Lithography System
SF-100 XTEND
Combine Both Large & SMall Feature Patterning on One System

The SF-100 XTREME

Full Featured & Versatile Maskless Microlithography

If you need a complete maskless lithography system to do advanced research or photomask fabrication, look no further than the SF-100 XTREME. This system comes with everything you need to do high precision, quick turnaround maskless photoresist patterning. Through advanced system design, important process variables such as exposure wavelength, pixel size and exposure energy level are easily chosen by the user so the system can work within your existing process and be compatible with your existing materials.


The SF-100 XTREME Comes Complete with the Following Standard Features:

  • Mercury arc lamp provides standard wavelength energies for compatibility with most commercial photoresists, polyimides, and SU8.

  • Changing wavelengths is a snap using our 6 position filter wheel, which is easily controlled through the software.

  • Our patented, field proven Smart Filter Technology is the heart of our system, using a TI DLP® chip to generate patterns.

  • Combining our high resolution CCD camera with National Instruments’ Vision Development® software package, functions such as autofocus, character recognition, and level to level alignment are easily provided and tailored to your specific needs.

  • Use our fully integrated XYZ theta stage to stitch together images to make large die or multiple copies of the same die on single substrate.

  • Fully integrated vibration isolation table ensures repeatable and consistent process results, down to 1 micron in size.

  • All stages come with XYZ and theta as standard. Theta provides full 360 degree travel and Z travel is a minimum of 25mm, allowing you to run different substrates easily. X and Y stage sizes start at 100mm travel, allowing users who pattern small substrates to minimize their capital investment and avoid purchasing a stage that is too large for their needs.

  • All 3 High Resolution reduction lenses are included, so changing pixel size is a snap.

  • Labwindows™ based software provides an open platform for software customization and integration with other systems.

  • Rapid prototyping of new designs and ideas without the need for costly photomasks.

  • IMP’s legendary customer service, engineering, and support services ensure your success.

  • Complete 1 year warranty, including customer training at system witness and at the customer site are included with each system purchase.

Click here to download the SF-100 XTREME brochure.


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