Ion Beam Sources
Gridless End-Hall Ion Sources
Using intense magnetic fields and substantial electron currents, low maintenance, gridless ion sources are able to produce a very high current density at lower energies than is practical with gridded sources. Gridless ion sources are available in both round and linear configurations and can be configured with or without filaments, depending upon the process requirements.
DC Ion Sources
DC sources are easy to install, clean and maintain. These ion sources provide broad, uniform, monoenergetic ion beams that are used in a variety of research and production applications, most of which involve surface modification, such as etching and deposition. DC sources are ideal for operation in inert environments or very short duration operation in oxidising environments.
RF Ion Sources
Filamentless, RF sources are low maintenance and ideal for processes using 100% argon, oxygen or other reactive gases. RF sources produce broad, uniform, monoenergetic ion beams in both inert and oxidising environments. In addition, these sources have very long maintenance intervals, making them ideal for both batch and load-locked production.
A variety of power supplies are available to drive Veeco DC, RF & End-Hall ion sources. These state of the art power supplies are all microprocessor controlled and provide multiple modes of operation. Separate supplies can be provided to operate a hollow cathode, hot filament, RF or Plasma-Bridge Neutralizer.
Spares, Service, Installation and Consumable Parts
Scotech can provide many Ion Source spare and consumable parts from stock. Call us for information on spare parts, installation, service or repair of Ion Sources or Power Supplies.
Isoflux Cylindrical Magnetrons (ICM) use cylindrical targets to surround the substrate with coating materials. Used to coat complex 3-dimensional substrates, wires and fibres the ICM design is more efficient than planar magnetrons and offers higher deposition rates, excellent target utilization, less down time and relatively inexpensive targets.